etchingly remove photoresist etch residue material

09:14 Mar 21, 2020
This question was closed without grading. Reason: No acceptable answer

English to French translations [PRO]
Tech/Engineering - Electronics / Elect Eng / composition pour l'électronique
English term or phrase: etchingly remove photoresist etch residue material
A fifth aspect relates to methods of manufacturing an article comprising a microelectronic device, said method comprising contacting the microelectronic device with a composition for sufficient time to etchingly remove titanium nitride and/or photoresist etch residue material from the surface of the microelectronic device having same thereon, and incorporating said microelectronic device into said article, wherein the composition comprises, consists of or consists essentially of at least one oxidizing agent, at least one etchant, at least one activator, at least one oxidizing agent stabilizer, and at least one solvent.
orgogozo
France
Local time: 07:39


Summary of answers provided
3enlever par décapage les résidus de matières photorésistantes
Christian Fournier


Discussion entries: 3





  

Answers


1 hr   confidence: Answerer confidence 3/5Answerer confidence 3/5
enlever par décapage les résidus de matières photorésistantes


Explanation:
suggestion

Christian Fournier
France
Local time: 07:39
Native speaker of: Native in FrenchFrench
PRO pts in category: 54

Peer comments on this answer (and responses from the answerer)
neutral  Clem Deviers: N'avez-vous pas omis "etch"?
4 hrs

neutral  Tony M: The problem is, 'etch' could be key here — from its position in the word order, it seems to suggest this is NOT the actual photoresist itself, but the 'etch residues' from it; I wonder if it simply means 'the photoresist remaining after etching'? Or not..
1 day 2 hrs
  -> Hello Tony! I agree with your interpretation - please refer to my comment in the discussion.
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