GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW) | ||||||
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16:40 Jan 14, 2012 |
English to Bulgarian translations [PRO] Law/Patents - Economics | |||||||
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| Selected response from: Ekaterina Kroumova | ||||||
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4 +2 | Права върху топологията на интегрални схеми |
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5 | (интелектуални) права върху полупроводникови маски |
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Права върху топологията на интегрални схеми Explanation: Форма на интелектуална собственост Справка: ЗАКОН ЗА ТОПОЛОГИЯТА НА ИНТЕГРАЛНИТЕ СХЕМИ In United States intellectual property law, a mask work is a two or three-dimensional layout or topography of an integrated circuit (IC or "chip"), i.e. the arrangement on a chip of semiconductor devices such as transistors and passive electronic components such as resistors and interconnections. The layout is called a mask work because, in photolithographic processes, the multiple etched layers within actual ICs are each created using a mask, called the photomask, to permit or block the light at specific locations, sometimes for hundreds of chips on a wafer simultaneously. -------------------------------------------------- Note added at 59 mins (2012-01-14 17:39:57 GMT) -------------------------------------------------- Впрочем, за същия термин е даден превод на руски ето тук: http://www.proz.com/kudoz/english_to_russian/patents/3396913... Reference: http://ipbulgaria.bg/?legal=zakon-za-topologiyata-na-integra... Reference: http://en.wikipedia.org/wiki/Mask_work |
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1 hr confidence:
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